Researchers sponsored by Semiconductor Research Corporation (SRC) today announced that they have developed a new laser-based method for ultra-fast anneal of thin photoresist films used to transfer ...

Fast anneal expected to impact a wide range of quantum computing applications, from advancing scientific research in quantum simulation and AI, to solving real-world problems across industries PALO ...

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Tool vendor Ultratech Inc. on Tuesday unveiled its next generation Unity platform, saying that all of its future generation tools would be built on the platform. The product of a four-year development ...

In the LSA101 system, a single CO2 laser beam is used to heat the wafer surface from a substrate temperature of approximately 400C to the peak annealing temperature in the range 1100-1350C. In the ...