Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...
Download this article in PDF format. Directional couplers are used in a wide variety of applications to sense RF power, and they may appear at multiple points in a signal chain. In this article, we ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback