A technique used on older process nodes is providing even more valuable benefits as IC designers work on devices that will be manufactured at advanced technology nodes including 28 nm and beyond. Now ...

BEOL metal line RC delay has become a dominant factor that limits chip performance at advanced nodes [1]. Smaller metal line pitches require a narrower line CD and line to line spacing, which ...

The future of circuit design, encompassing analog, RF/5G, and custom electronic circuits, is set to be revolutionized by the integration of generative AI tools. These advanced tools will not only ...

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